Nikon 使用 POLANO 将干式光刻技术推至 65 nm 节点以下
Nikon 使用 POLANO 将干式光刻技术推至 65 nm 节点以下
2004 年 11 月 20 日
高级偏振控制将图像对比度提高 20%
加利福尼亚州贝尔蒙特 – 2004 年 11 月 20 日 – 尼康公司宣布已开发出 POLANO*，这是业界首款用于 IC 光刻系统的先进偏振照明系统。POLANO 将图像对比度提高了 20%，从而实现了卓越的分辨率、焦深和关键尺寸 （CD） 均匀性。偏振照明控制优化了具有超高 NA 透镜 （>0.90 NA） 的光刻系统的性能。POLANO 将分辨率提高了半代，而不会损失照明强度，也不会影响吞吐量。
POLANO 将于 2005 年春季作为选件安装在尼康最新的 ArF 扫描仪系统 NSR-S308F 上，该系统将于下个月开始发货。POLANO 也将用于尼康的 ArF 浸没式系统，其 NA 将大于 1.0，并将于 2005 年下半年开始发货。
高数值孔径光刻系统，无论是干式还是湿式，都将受益于尼康先进的偏振照明系统。尼康成功地将照明光转变为 s 偏振光，从而提高了图像对比度。Nikon 不仅是偏振照明控制领域的创新领导者，而且 Nikon 能够在不损失照明强度或系统生产率的情况下开发该系统。
在分辨率为 65 nm 或更高的 NSR-S308F 上使用 POLANO 时，分辨率极限提高了一半。改进的图像对比度增加了曝光余量并增强了 CD 均匀性，这是 IC 制造商的一个关键参数。CD 均匀性可以提高多达 20%。
“我们正在扩展工具的分辨率限制，而不会影响工作效率。分辨率、焦深和 CD 均匀性都得到了显著提高，“Nikon Precision， Inc. 首席执行官 Geoff Wild 表示。他继续说道：“这是 Nikon 的又一项重大技术进步，行业将很快接受。
*POLANO：NSR 光学先进光刻的偏振优化
关于尼康
自 1980 年以来，尼康公司一直在通过创新产品和技术彻底改变光刻技术。该公司是微电子制造行业光刻设备的全球领导者，在全球安装了 7,600 多套曝光系统。Nikon 提供业内最广泛的生产级步进机和扫描仪选择。这些产品服务于半导体、平板显示器 （LCD） 和薄膜磁头 （TFH） 行业。Nikon Precision Inc. 在北美为 Nikon 光刻设备提供服务、培训、应用和技术支持，以及销售和营销。有关尼康的更多信息，请访问我们的网站 www.nikonprecision.com
前瞻性陈述
本新闻稿包含 1995 年《私人证券改革法案》中定义的前瞻性陈述，这些陈述受到已知和未知风险和不确定性的影响，可能导致实际结果与此类陈述中明示或暗示的结果存在重大差异。此类陈述受风险、不确定性和状况变化的影响，尤其是与行业要求和其他风险相关的陈述。公司不承担更新本新闻稿中信息的义务。
Nikon Pushes Dry Lithography below the 65 nm Node with POLANO
November 20, 2004
Advanced Polarization Control Improves Image Contrast by 20 Percent
Belmont, California – November 20, 2004 – Nikon Corporation announced it has developed POLANO*, the industry’s first advanced polarized illumination system for IC lithography systems. POLANO improves image contrast by 20 percent, resulting in superior resolution, depth of focus, and critical dimension (CD) uniformity. Polarized illumination control optimizes the performance of lithography systems with ultra-high NA lenses (>0.90 NA). POLANO provides a half-generation improvement in resolution with no loss of illumination intensity and no impact to throughput.
POLANO is available as an option in the spring of 2005 on the NSR-S308F, Nikon’s newest ArF scanner system, which starts shipping next month. POLANO will also be available on Nikon’s ArF immersion system which will have an NA greater than 1.0, and will begin shipment in the second half of 2005.
High NA lithography systems, dry or wet, will benefit from Nikon’s advanced polarized illumination system. Nikon has succeeded in changing the illumination light into s-polarized light that boosts image contrast. Not only is Nikon the innovation leader in polarized illumination control, but Nikon was able to develop the system with no loss of illumination intensity or system productivity.
When using POLANO on the NSR-S308F, which has a resolution capability of 65 nm or better, the resolution limit is improved by a half-generation. The improved image contrast increases the exposure margin and enhances the CD uniformity, a critical parameter for IC manufacturers. CD uniformity can be improved by as much as 20 percent.
“We’re extending the resolution limits of our tools with no impact to productivity. Resolution, depth of focus, and CD uniformity are all substantially improved” stated Geoff Wild CEO of Nikon Precision, Inc. He continued “This is another great technical advancement from Nikon that the industry will quickly embrace.”
*POLANO: Polarization Optimization for Lithographic Advance in NSR Optics
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,600 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our web site at www.nikonprecision.com
Forward Looking Statements
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
厂家名称
深圳市矢量科学仪器有限公司是集半导体仪器装备代理及技术服务的国家级高新技术企业。 致力于提供半导体前道制程工艺装备、后道封装装备、半导体分析测试设备、半导体光电测试仪表及相关仪器装备维护、保养、售后技术支持及实验室整体...